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Cleanroom


The cleanroom offers ample hood space, an optical microscope, internet access and (in the rightmost hood) a spin coater.

Lithographic resists can be spun onto samples using this spin coater.

The rapid thermal annealer (RTA) is used to improve the semiconductor/metal interface in our devices.

The Oxygen Plasma Cleaner (left) and Ozone Stripper (right) are used to clean organics off of samples.

This BOC Edwards E-beam evaporator uses an electron beam to heat a metal source and deposit thin metal films.

This BOC Edwards Thermal evaporator uses resistive heating to volitize a metal source and deposit thin metal films.

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